SURFACE-STRESS-INDUCED STRUCTURE AND ELASTIC BEHAVIOR OF THIN-FILMS

被引:43
作者
WOLF, D
机构
[1] Materials Science Division, Argonne National Laboratory, Argonne
关键词
D O I
10.1063/1.105017
中图分类号
O59 [应用物理学];
学科分类号
摘要
Computer simulations of unsupported (111), (001), and (011) thin films of gold, using an embedded-atom-method potential, demonstrate a direct correlation between the bulk-surface stress and the film dimensions. The considerably more complex elastic behavior, by contrast, appears to be dominated by the atomic structure of the film surfaces, and not by the stress-induced anisotropic lattice parameter changes.
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页码:2081 / 2083
页数:3
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