DIRECT PHOTOCHEMICAL DEPOSITION OF SIO2 FROM THE SI2H6+O2 SYSTEM

被引：37

作者：

MISHIMA, Y ^{[1
]}

HIROSE, M ^{[1
]}

OSAKA, Y ^{[1
]}

ASHIDA, Y ^{[1
]}

机构：

[1] MITSUI TOATSU CHEM INC, DEPT CORP DEV, TOKYO 100, JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 55卷 / 04期

关键词：

D O I：

10.1063/1.333172

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1234 / 1236

页数：3

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