AMORPHOUS SILICIDE FORMATION BY THERMAL-REACTION - A COMPARISON OF SEVERAL METAL-SILICON SYSTEMS

被引：55

作者：

HOLLOWAY, K

SINCLAIR, R

NATHAN, M

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

[2] MARTIN MARIETTA CORP LABS,BALTIMORE,MD 21227

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576081

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1479 / 1483

页数：5

共 32 条

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