DEPOSITION PROCESS AND SOME CHARACTERISTICS OF TIS2 PREPARED BY PLASMA CVD

被引:1
作者
KIKKAWA, S
MIYAZAKI, M
LIU, Y
KANAMARU, F
机构
[1] The Institute of Scientific and Industrial Research, Osaka University, Ibaraki, Osaka
关键词
D O I
10.1016/0167-2738(90)90068-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Crystallite size of the product was affected by an applied RF-power in the plasma CVD of TiS2 in the reactant system of TiCl4 and H2S. Unexpectedly large discharge capacity was observed on a lithium battery by using TiS2 thin film prepared at RF-power of 15 W, which is the smallest value to sustain a stable plasma. Mass spectroscopy was applied to investigate gaseous species in the CVD reaction by varing RF-power. Reactants, TiCl4 and H2S were not broken into their fragments, but were excited to initiate a polymerization for TiS2. Transmission electron micrograph showed that the present TiS2 crystals are highly defective. These defects may contribute to the large capacity of the lithium battery. © 1990.
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页码:553 / 556
页数:4
相关论文
共 6 条
[1]   TITANIUM DISULFIDE FILMS FABRICATED BY PLASMA CVD [J].
KANEHORI, K ;
ITO, Y ;
KIRINO, F ;
MIYAUCHI, K ;
KUDO, T .
SOLID STATE IONICS, 1986, 18-9 :818-822
[2]  
KATO A, 1982, KAGAKU KOGAKU, V46, P524
[3]   PLASMA ASSISTED CVD OF TIS2 [J].
KIKKAWA, S ;
SHIMANOUCHIFUTAGAMI, R ;
KOIZUMI, M .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1989, 49 (01) :105-109
[4]  
KIKKAWA S, IN PRESS J MAT RES
[5]  
MIYAZAKI M, 1989, THESIS OSAKA U
[6]   PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF TITANIUM SULFIDES [J].
SHIMANOUCHI, R ;
YAMAMOTO, T ;
KIKKAWA, S ;
KOIZUMI, M .
CHEMISTRY LETTERS, 1985, (09) :1323-1326