MATERIALS ANALYSIS USING SPUTTER INITIATED RESONANCE IONIZATION SPECTROSCOPY

Resonance Ionization Spectroscopy (RIS) is a sensitive and selective ionization technique capable of single atom detection. This technique has been applied to the trace element analysis of solids in a process called Sputter Initiated Resonance Ionization Spectroscopy (SIRIS). The authors briefly review RIS and SIRIS. Recent results are presented for measurements of boron concentrations down to the ppm level in standard steel and silicon samples. Some preliminary results are also presented for uranium and uranium compounds. A detection efficiency for SIRIS is reported which will make possible a sensitivity of 2 ppb.