PHOTOSTRUCTURING OF A POLYMER CONTAINING ANTHRYLENE-BISACRYLATE SUBUNITS

被引:13
作者
PAUL, S
STEIN, S
KNOLL, W
MULLEN, K
机构
[1] MAX PLANCK INST POLYMER RES,ACKERMANNWEG 10,D-55128 MAINZ,GERMANY
[2] INST PHYS & CHEM RES RIKEN,FRONTIER RES PROGRAM,WAKO,SAITAMA 35101,JAPAN
关键词
D O I
10.1002/actp.1994.010450315
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
A new polymer P containing anthrylene-bisacrylate subunits is presented which allows the preparation of spin-cast films of high optical and geometrical homogeneity.Upon irradiation of these films with UV light,both a change in the optical thickness (= geometrical thickness d x refractive index n) and a decrease of the solubility can be induced due to photo-crosslinking of the polymer chains. These features make the new polymer a promising material for both optical information storage and photolithography and/or for a possible combination of the two effects.
引用
收藏
页码:235 / 243
页数:9
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