COSPUTTERING OF ALLOYS .1. COSPUTTERING OF OXIDES AND NITRIDES USING 2 PLANAR MAGNETRONS

被引：11

作者：

BELKIND, A ^{[1
]}

EZELL, E ^{[1
]}

GERRISTEAD, W ^{[1
]}

ORBAN, Z ^{[1
]}

RAFALKO, P ^{[1
]}

DOW, D ^{[1
]}

FELTS, J ^{[1
]}

LAIRD, R ^{[1
]}

机构：

[1] AIRCO COATING TECHNOL,CONCORD,CA 94524

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期

关键词：

D O I：

10.1116/1.577403

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A study to explore the properties of mixed oxides and nitrides deposited using reactive cosputtering from two rectangular cathodes is reviewed. Deposition results of some mixed oxides and nitrides made using cosputtering from different pairs of elemental targets (Al, Ti, and Zr) are presented. Structure, composition, optical and mechanical properties of the single and mixed oxides and nitrides are also presented and reviewed in this paper.

引用

页码：530 / 536

页数：7