XPS STUDIES ON NBN THIN-FILMS - RF CLEANING, NATIVE OXIDATION AND THERMAL-OXIDATION BETWEEN 20-DEGREES-C AND 200-DEGREES-C. COMPARISON WITH NB THIN-FILMS

被引：2

作者：

ERMOLIEFF, A

机构：

来源：

REVUE DE PHYSIQUE APPLIQUEE | 1984年 / 19卷 / 12期

关键词：

D O I：

10.1051/rphysap:019840019012097900

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：979 / 986

页数：8

共 13 条

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[8] AUGER-ELECTRON SPECTROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THE OXIDATION OF POLYCRYSTALLINE TANTALUM AND NIOBIUM AT ROOM-TEMPERATURE AND LOW OXYGEN PRESSURES [J].

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[9]

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[10]

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