BIAS-TEMPERATURE-STRESS STUDIES OF CHARGE RETENTION IN DUAL-DIELECTRIC, CHARGE-STORAGE CELLS

被引：7

作者：

THORNBER, KK ^{[1
]}

KAHNG, D ^{[1
]}

NEPPELL, CT ^{[1
]}

机构：

[1] BELL TELEPHONE LABS INC, UNIPOLAR INTEGRATED CIRCUIT LAB, MURRAY HILL, NJ 07971 USA

来源：

BELL SYSTEM TECHNICAL JOURNAL | 1974年 / 53卷 / 09期

关键词：

D O I：

10.1002/j.1538-7305.1974.tb02814.x

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1741 / 1770

页数：30

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