LEAKAGE-CURRENT-INDUCED HOT-CARRIER DEGRADATION OF P-CHANNEL MOSFETS

被引:12
作者
RODDER, M
机构
关键词
D O I
10.1109/55.9280
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:573 / 575
页数:3
相关论文
共 5 条
[1]  
Chan T. Y., 1987, IEDM TECH DIG, P718
[2]   THEORY OF TUNNELING INTO INTERFACE STATES [J].
FREEMAN, LB ;
DAHLKE, WE .
SOLID-STATE ELECTRONICS, 1970, 13 (11) :1483-+
[3]   HOT-ELECTRON-INDUCED MOSFET DEGRADATION - MODEL, MONITOR, AND IMPROVEMENT [J].
HU, CM ;
TAM, SC ;
HSU, FC ;
KO, PK ;
CHAN, TY ;
TERRILL, KW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (02) :375-385
[4]   EFFECTS OF HOT-CARRIER TRAPPING IN N-CHANNEL AND P-CHANNEL MOSFETS [J].
NG, KK ;
TAYLOR, GW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (08) :871-876
[5]   RELATIONSHIP BETWEEN HOT-ELECTRONS HOLES AND DEGRADATION OF P-CHANNEL AND N-CHANNEL MOSFETS [J].
TSUCHIYA, T ;
FREY, J .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (01) :8-11