FORMATION KINETICS OF PBZRXTI1-XO3 THIN-FILMS

被引:71
作者
KWOK, CK [1 ]
DESU, SB [1 ]
机构
[1] VIRGINIA POLYTECH INST & STATE UNIV,DEPT MAT SCI & ENGN,BLACKSBURG,VA 24061
关键词
D O I
10.1557/JMR.1994.1728
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The pyrochlore to perovskite transition in sputtered PZT thin films has been studied using SEM and XRD. The films were annealed in the temperature range between 350-degrees-C and 750-degrees-C, and the transition temperature for pyrochlore to perovskite transition was found to be around 525-degrees-C. Isothermal annealing was used to study the nucleation and growth kinetics of the perovskite phase. The results showed a linear growth rate for the perovskite phase, thereby indicating an interface controlled process. Also, the growth was found to be isotropic in two dimensions parallel to the plane of the substrate. The nucleation of the perovskite phase was found to be random. The effective activation energy of the perovskite transition was found to be 494 kJ/mol using Avrami's approach.
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收藏
页码:1728 / 1733
页数:6
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