THIN-FILM BREAKDOWN COUNTER OF FISSION FRAGMENTS

被引：41

作者：

TOMMASINO, L

KLEIN, N

SOLOMON, P

机构：

[1] COMITATO NAZL ENERGIA NUCL, ROME, ITALY

[2] TECHNION ISRAEL INST TECHNOL, DEPT ELECTR ENGN, HAIFA, ISRAEL

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 04期

关键词：

D O I：

10.1063/1.321798

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1484 / 1488

页数：5

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[9] ELECTRICAL PULSE BREAKDOWN OF SILICON OXIDE FILMS [J].

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[10] MAXIMUM DIELECTRIC STRENGTH OF THIN SILICON OXIDE FILMS [J].

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