OXIDATION BEHAVIOR OF SIALONS

被引：22

作者：

SINGHAL, SC ^{[1
]}

LANGE, FF ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP, CTR RES & DEV, PITTSBURGH, PA 15235 USA

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1977年 / 60卷 / 3-4期

关键词：

D O I：

10.1111/j.1151-2916.1977.tb15514.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：190 / 191

页数：2

共 10 条

[1]

ARROL WJ, 1974, CERAMICS HIGH PERFOR, P731

[2] CONTRIBUTION TO PHASE-DIAGRAM SI3N4-ALN-AL2O3-SIO2 [J].

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LUKAS, HL ;

PETZOW, G .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1975, 58 (7-8) :346-347

[3] CERAMICS BASED ON SI-AL-O-N AND RELATED SYSTEMS [J].

JACK, KH ;

WILSON, WI .

NATURE-PHYSICAL SCIENCE, 1972, 238 (80) :28-+

[4]

LUMBY RJ, 1975, SPECIAL CERAMICS, V6, P283

[5]

McMurdie H. F, 1964, PHASE DIAGRAMS CERAM

[6]

NELSON JA, 1971, PRACT METALLOGR, V8, P310

[7] SOLID-SOLUTION IN TERNARY-SYSTEM, SI3N4-AIN-AL2O3 [J].

OYAMA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1972, 11 (05) :760-&

[8] SOLID-SOLUTION IN SYSTEM SI3N4-GA2O3-AL2O3 [J].

OYAMA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1973, 12 (04) :500-508

[9]

Oyama Y., 1972, Yogyo-Kyokai-Shi, V80, P327, DOI 10.2109/jcersj1950.80.924_327

[10] THERMODYNAMICS AND KINETICS OF OXIDATION OF HOT-PRESSED SILICON-NITRIDE [J].

SINGHAL, SC .

JOURNAL OF MATERIALS SCIENCE, 1976, 11 (03) :500-509

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