EFFECTS OF AR PRESSURE AND SUBSTRATE BIAS ON MAGNETIC-PROPERTIES AND MICROSTRUCTURE IN AMORPHOUS TBCO SPUTTERED FILMS

被引：22

作者：

OHKOSHI, M

HARADA, M

TOKUNAGA, T

HONDA, S

KUSUDA, T

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1985年 / 21卷 / 05期

关键词：

D O I：

10.1109/TMAG.1985.1064134

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1635 / 1637

页数：3

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