Cross-sectional Raman microscopy of MeV implanted diamond

被引:43
作者
Jamieson, DN [1 ]
Prawer, S [1 ]
Nugent, KW [1 ]
Dooley, SP [1 ]
机构
[1] UNIV MELBOURNE, SCH PHYS, PARKVILLE, VIC 3052, AUSTRALIA
关键词
D O I
10.1016/0168-583X(96)80036-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The defect structures created in diamond by MeV He ion implantation are studied using Raman microscopy. The diamond was irradiated edge on, and the micro-Raman spectra were collected in a direction perpendicular to the implantation direction. This 'cross-sectional' geometry allowed the Raman spectrum of the damage to be resolved as a function of depth from the ion implanted surface. Both the position and the FWHM of the first order Raman mode at 1332 cm(-1) were found to scale linearly with dose; a result readily interpretable as defect induced strain in the implanted layer. The measurements thus provide the depth profile of ion implanted damage in MeV irradiated diamond, and allow a direct test of the accuracy of theoretical models, such as TRIM, for the assessment of damage in ion irradiated diamond.
引用
收藏
页码:641 / 645
页数:5
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