COMPUTER-SIMULATION OF THIN AMORPHOUS SI FILMS ON CRYSTALLINE SI SUBSTRATES

被引：12

作者：

ERKOC, S ^{[1
]}

HALICIOGLU, T ^{[1
]}

TILLER, WA ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

来源：

关键词：

D O I：

10.1016/S0022-3093(87)80257-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：28 / 35

页数：8

共 41 条

[1] ALPER AM, 1970, PHASE DIAGRAMS MATER, pCH6
[2] Bagley B.G., 1979, AIP CONF P, V50, P97, DOI [10.1063/1.31740, DOI 10.1063/1.31740]
[3] Barin I., 1973, THERMODYNAMIC PROPER
[4] BIENENSTOCK A, 1973, AMORPHOUS LIQUID SEM, P49
[5] CARDILLO MJ, 1982, CHEM PHYSICS SOLID S, V4, P149
[6] EFFECTS OF HIGH-PRESSURE MOLECULAR-HYDROGEN IN A-SI-H
CHABAL, YJ
PATEL, CKN
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1985, 77-8 : 201 - 212
[7] CONNEL GAN, 1980, HDB SEMICONDUCTORS, V3, P689
[8] DONOHUE J, 1974, STRUCTURE ELEMENTS, pCH7
[9] Evans D.J., 1984, COMPUT PHYS REP, V1, P299
[10] THE STRUCTURE AND CHEMISTRY OF CRYSTAL-SURFACES
FORTY, AJ
[J]. CONTEMPORARY PHYSICS, 1983, 24 (03) : 271 - 299