THE CHEMISTRY OF ALKYL ALUMINUM COMPOUNDS DURING LASER-ASSISTED CHEMICAL VAPOR-DEPOSITION

被引：27

作者：

HIGASHI, GS

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 43卷

关键词：

D O I：

10.1016/0169-4332(89)90182-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：6 / 10

页数：5

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[7] SUBTHERMAL PHOTOPRODUCT SURFACE DESORPTION DISTRIBUTIONS ARISING FROM EXCIMER LASER EXCITATION OF ADSORBED TRIMETHYLALUMINUM [J].

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[10]

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