4F PHOTOEMISSION FROM CE CLUSTERS AND DISORDERED REACTION-PRODUCTS AT CE/SI AND CE/GAAS INTERFACES

被引：23

作者：

FUJIMORI, A ^{[1
]}

GRIONI, M ^{[1
]}

JOYCE, JJ ^{[1
]}

WEAVER, JH ^{[1
]}

机构：

[1] UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA

来源：

PHYSICAL REVIEW B | 1985年 / 31卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.31.8291

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：8291 / 8294

页数：4

共 38 条

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