ABNORMAL DIFFUSION BEHAVIOR OF YB+ AND ER+ IMPLANTED IN KTIOPO4

被引：8

作者：

WANG, KM

DING, PJ

WANG, W

LANFORD, WA

LI, Y

LI, JS

LIU, YG

机构：

[1] SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222

[2] CHINESE ACAD SCI,INST PHYS,CHANGCHUN,PEOPLES R CHINA

[3] SHANDONG UNIV,INST CRYSTAL MAT,JINAN 250100,PEOPLES R CHINA

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 23期

关键词：

D O I：

10.1063/1.111360

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

400 keV Yb+ and 300 keV Er+ were implanted into potassium titanyl phosphate (KTiOPO4 or KTP) with doses of 3 x 10(15) and 1 X 10(15) ions/cm2, respectively. The samples were annealed in the temperature range 600 to 800-degrees-C in Ar ambient. The diffusion behaviors of implanted Yb+ and Er+ in KTiOPO4 were investigated by Rutherford backscattering of 2.0 MeV He ions. The results show that no obvious diffusion of Yb+ and Er+ in KTiOPO4 is detected at 600-degrees-C annealing, but there are three and two peaks of implanted rare-earth ion distribution after 800-degrees-C annealing for the case of Yb+ and Er+, respectively. An explanation of these phenomena is suggested.

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页码：3101 / 3103

页数：3

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