3RD-ORDER NONLINEAR OPTICAL SUSCEPTIBILITIES OF AMORPHOUS SNO2-X THIN-FILMS

被引：13

作者：

ENDO, H

SAKAI, M

WATANABE, Y

TAKATA, M

机构：

[1] Department of Electrical Engineering, Nagaoka University of Technology, Nagaoka

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 06期

关键词：

D O I：

10.1063/1.108910

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Amorphous SnO2-x (X=0-1) thin films are prepared on glass substrates by using a radio-frequency magnetron sputtering technique and the third-order nonlinear optical susceptibilities chi(3) (-3omega; omega, omega, omega) are evaluated by the third-harmonic generation (THG) method. The values of chi(3) are found to increase with decreasing the oxygen content in the samples. The chi(3) of the present sample is larger by several times than that of crystalline SnO2 thin film in which the chi(3) is about 10(-12) esu order. These values are very large among those for inorganic materials at the nonresonant region.

引用

页码：559 / 560

页数：2

共 6 条

[1]

Butcher P. N., 1990, ELEMENTS NONLINEAR O

[2] SIMPLE METHOD FOR DETERMINATION OF OPTICAL-CONSTANTS N,K AND THICKNESS OF A WEAKLY ABSORBING THIN-FILM [J].