THE ROLE OF FLUORINE IN IMPLANTED AMORPHOUS-SILICON

被引:11
作者
WONG, SP
POON, MC
KWOK, HL
LAM, YW
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D O I
10.1149/1.2108364
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2172 / 2177
页数:6
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TSAI, MY ;
STREETMAN, BG .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (01) :183-187
[42]   RECRYSTALLIZATION OF IMPLANTED AMORPHOUS SILICON LAYERS .2. MIGRATION OF FLUORINE IN BF2+-IMPLANTED SILICON [J].
TSAI, MY ;
DAY, DS ;
STREETMAN, BG ;
WILLIAMS, P ;
EVANS, CA .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (01) :188-192
[43]  
van Der Pauw L. J., 1958, PHILIPS RES REP, V13, P1