REACTIONS AT THE OXIDE-ELECTROLYTE INTERFACE OF ANODIC OXIDE-FILMS ON ALUMINUM

被引：88

作者：

VALAND, T ^{[1
]}

HEUSLER, KE ^{[1
]}

机构：

[1] TECH UNIV CLAUSTHAL,KORROS ABT,D-3392 CLAUSTHAL ZELLERFE,FED REP GER

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 1983年 / 149卷 / 1-2期

关键词：

D O I：

10.1016/S0022-0728(83)80559-2

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：71 / 82

页数：12

共 21 条

[11]

HEUSLER KE, 1970, WERKST KORROS, V26, P694

[12]

OSULLIVAN JP, 1970, P R SOC A, V317, P516

[13]

Vetter K. J., 1963, J ELECTROCHEM SOC, V110, P597

[14] GENERAL KINETICS OF PASSIVE LAYERS ON METALS [J].

VETTER, KJ .

[15]

VETTER KJ, 1962, Z ELEKTROCHEM, V66, P577

[16]

Vetter KJ, 1970, WERKST KORROS, V21, P703

[17]

Wood G.C., 1973, OXIDES OXIDE FILMS, P167

YATES, DE ;

HEALY, TW .

JOURNAL OF THE CHEMICAL SOCIETY-FARADAY TRANSACTIONS I, 1980, 76 :9-18

[19] ZERO POINT OF CHARGE OF ALPHA-ALUMINA [J].

YOPPS, JA ;

FUERSTENAU, DW .

JOURNAL OF COLLOID SCIENCE, 1964, 19 (01) :61-&

[20]

YOUNG L, 1961, ANODIC OXIDE FILMS, P220