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SLOW CURRENT TRANSIENTS IN METAL-OXIDE-SEMICONDUCTOR CAPACITORS
被引:7
作者
:
YAO, ZQ
论文数:
0
引用数:
0
h-index:
0
机构:
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
YAO, ZQ
[
1
]
DIMITRIJEV, S
论文数:
0
引用数:
0
h-index:
0
机构:
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
DIMITRIJEV, S
[
1
]
TANNER, P
论文数:
0
引用数:
0
h-index:
0
机构:
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
TANNER, P
[
1
]
HARRISON, HB
论文数:
0
引用数:
0
h-index:
0
机构:
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
HARRISON, HB
[
1
]
机构
:
[1]
GRIFFITH UNIV,SCH MICROELECTR ENGN,NATHAN,QLD 4111,AUSTRALIA
来源
:
APPLIED PHYSICS LETTERS
|
1995年
/ 66卷
/ 19期
关键词
:
D O I
:
10.1063/1.113150
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
Glitches of positive current at negative voltages have been observed during current-voltage measurements of metal-oxide semiconductor capacitors. The magnitude of the glitches depends on both stepping rate and duration of holding the metal electrode at the most negative potential before stepping towards positive potentials is initiated. Current versus time measurements show a voltage-dependent time constant, generally >100 ms. Charging/discharging of border traps is suggested as a possible cause for this effect.© 1995 American Institute of Physics.
引用
收藏
页码:2510 / 2512
页数:3
相关论文
共 6 条
[1]
EFFECTS OF OXIDE TRAPS, INTERFACE TRAPS, AND BORDER TRAPS ON METAL-OXIDE-SEMICONDUCTOR DEVICES
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
FLEETWOOD, DM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
WINOKUR, PS
;
REBER, RA
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
REBER, RA
;
MEISENHEIMER, TL
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
MEISENHEIMER, TL
;
SCHWANK, JR
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
SCHWANK, JR
;
SHANEYFELT, MR
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
SHANEYFELT, MR
;
RIEWE, LC
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
RIEWE, LC
.
JOURNAL OF APPLIED PHYSICS,
1993,
73
(10)
:5058
-5074
[2]
BORDER TRAPS IN MOS DEVICES
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories., Dept., NM, 87185–5800., 1332, Albuquerque
FLEETWOOD, DM
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1992,
39
(02)
:269
-271
[3]
Nicollian E. H., 1982, METAL OXIDE SEMICOND
[4]
HIGH-QUALITY ULTRATHIN DIELECTRIC FILMS GROWN ON SILICON IN A NITRIC-OXIDE AMBIENT
[J].
YAO, ZQ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YAO, ZQ
;
HARRISON, HB
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
HARRISON, HB
;
DIMITRIJEV, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
DIMITRIJEV, S
;
SWEATMAN, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
SWEATMAN, D
;
YEOW, YT
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YEOW, YT
.
APPLIED PHYSICS LETTERS,
1994,
64
(26)
:3584
-3586
[5]
THE ELECTRICAL-PROPERTIES OF SUB-5-NM OXYNITRIDE DIELECTRICS PREPARED IN A NITRIC-OXIDE AMBIENT USING RAPID THERMAL-PROCESSING
[J].
YAO, ZQ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YAO, ZQ
;
HARRISON, HB
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
HARRISON, HB
;
DIMITRIJEV, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
DIMITRIJEV, S
;
YEOW, YT
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YEOW, YT
.
IEEE ELECTRON DEVICE LETTERS,
1994,
15
(12)
:516
-518
[6]
1989, HP4145B SEMICONDUCTO
←
1
→
共 6 条
[1]
EFFECTS OF OXIDE TRAPS, INTERFACE TRAPS, AND BORDER TRAPS ON METAL-OXIDE-SEMICONDUCTOR DEVICES
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
FLEETWOOD, DM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
WINOKUR, PS
;
REBER, RA
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
REBER, RA
;
MEISENHEIMER, TL
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
MEISENHEIMER, TL
;
SCHWANK, JR
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
SCHWANK, JR
;
SHANEYFELT, MR
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
SHANEYFELT, MR
;
RIEWE, LC
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories, Department 1332, Albuquerque
RIEWE, LC
.
JOURNAL OF APPLIED PHYSICS,
1993,
73
(10)
:5058
-5074
[2]
BORDER TRAPS IN MOS DEVICES
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
机构:
Sandia National Laboratories., Dept., NM, 87185–5800., 1332, Albuquerque
FLEETWOOD, DM
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1992,
39
(02)
:269
-271
[3]
Nicollian E. H., 1982, METAL OXIDE SEMICOND
[4]
HIGH-QUALITY ULTRATHIN DIELECTRIC FILMS GROWN ON SILICON IN A NITRIC-OXIDE AMBIENT
[J].
YAO, ZQ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YAO, ZQ
;
HARRISON, HB
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
HARRISON, HB
;
DIMITRIJEV, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
DIMITRIJEV, S
;
SWEATMAN, D
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
SWEATMAN, D
;
YEOW, YT
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YEOW, YT
.
APPLIED PHYSICS LETTERS,
1994,
64
(26)
:3584
-3586
[5]
THE ELECTRICAL-PROPERTIES OF SUB-5-NM OXYNITRIDE DIELECTRICS PREPARED IN A NITRIC-OXIDE AMBIENT USING RAPID THERMAL-PROCESSING
[J].
YAO, ZQ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YAO, ZQ
;
HARRISON, HB
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
HARRISON, HB
;
DIMITRIJEV, S
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
DIMITRIJEV, S
;
YEOW, YT
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
UNIV QUEENSLAND,DEPT ELECT & COMP ENGN,ST LUCIA,QLD 4072,AUSTRALIA
YEOW, YT
.
IEEE ELECTRON DEVICE LETTERS,
1994,
15
(12)
:516
-518
[6]
1989, HP4145B SEMICONDUCTO
←
1
→