DETERMINATION OF THE FREQUENCY-DEPENDENT RESISTIVITY OF ULTRATHIN METALLIC-FILMS ON SI(111)

被引：25

作者：

PERSSON, BNJ ^{[1
]}

DEMUTH, JE ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY 10598 USA

来源：

PHYSICAL REVIEW B | 1985年 / 31卷 / 04期

关键词：

D O I：

10.1103/PhysRevB.31.1856

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1856 / 1862

页数：7

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