ALKYL COUPLING ON COPPER, SILVER, AND GOLD - CORRELATION BETWEEN THE COUPLING RATE AND THE METAL ALKYL BOND STRENGTH

被引:63
作者
PAUL, AM [1 ]
BENT, BE [1 ]
机构
[1] COLUMBIA UNIV,DEPT CHEM,NEW YORK,NY 10027
关键词
D O I
10.1006/jcat.1994.1137
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Recent studies have shown that high coverages of alkyl groups can be generated and isolated on metal surfaces under ultrahigh vacuum conditions by the thermal [Zaera, F., Acc. Chem. Res. 25, 260 (1992)] and photochemical [Zhou, X. -L., Zhu, X. -Y., and White, J. M., Surf. Sci. Rep. 13, 74 (1991)] dissociation of alkyl halides. This paper describes studies in which these approaches have been employed to study the coupling of methyl groups generated on a Au(111) surface. The coupling rate, as measured by temperature-programmed reaction experiments, is found to be sensitive to the structure of the surface. For a well-annealed surface, coupling occurs at approximately 270 K, but for a sputtered and incompletely annealed surface, coupling occurs at approximately 350 K. An interesting and unexpected finding is that coadsorbing P(CH3)3 with the methyl groups on a Au(100) surface inhibits the coupling reaction so that methyl radical desorption is observed. Similarities between the rates of methyl coupling and methyl radical desorption have also been observed previously for a Cu(111) surface, suggesting a correlation between the methyl coupling rate and the metal-alkyl bond strength. Such a correlation can account for the' trends in the coupling rates reported for alkyl groups on Ag(111), Au(100), Cu(111), and Cu(110). The coupling rate is fastest on surfaces and for alkyl groups that are expected to form the weakest carbon-metal bonds. (C) 1994 Academic Press, Inc.
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页码:264 / 271
页数:8
相关论文
共 27 条
[1]  
ANDERSEN OK, 1985, P INT SCH PHYSICS EN
[2]   IODOMETHANE DECOMPOSITION ON CU(110) - SURFACE-REACTIONS OF C1 FRAGMENTS [J].
CHIANG, CM ;
WENTZLAFF, TH ;
BENT, BE .
JOURNAL OF PHYSICAL CHEMISTRY, 1992, 96 (04) :1836-1848
[3]   CHEMISORPTION AND DECOMPOSITION OF TRIMETHYLGALLIUM ON GAAS(100) [J].
CREIGHTON, JR .
SURFACE SCIENCE, 1990, 234 (03) :287-307
[4]  
Emsley, 1989, ELEMENTS
[5]  
HALPERN J, 1990, ACS S SERIES, V428
[6]  
HARRIS JM, 1976, FUNDAMENTALS ORGANIC, P124
[7]   LOW-TEMPERATURE SELECTIVE-AREA DEPOSITION OF METALS - CHEMICAL VAPOR-DEPOSITION OF GOLD FROM ETHYL(TRIMETHYLPHOSPHINE)GOLD(I) [J].
HOLL, MMB ;
SEIDLER, PF ;
KOWALCZYK, SP ;
MCFEELY, FR .
APPLIED PHYSICS LETTERS, 1993, 62 (13) :1475-1477
[8]  
Kittel C., 1976, INTRO SOLID STATE PH
[9]  
LEVIN RD, IONIZATION POTENTIAL
[10]   FORMATION OF METHYL RADICALS DURING THE OXIDATIVE ADDITION OF IODOMETHANE TO A SINGLE-CRYSTAL COPPER SURFACE [J].
LIN, JL ;
BENT, BE .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1993, 115 (07) :2849-2853