BEHAVIOR OF THIN-FILMS AND BULK OXIDES UNDER MICROBEAM IRRADIATION

被引：4

作者：

TROCELLIER, P

机构：

[1] CEA-CNRS, Laboratoire Pierre Süe, Centre d'Etudes de Saclay

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 104卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)00468-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Thin films (carbon, titanium, titanium hydride, chromium, nickel, tantalum, tantalum oxide and gold) both with bulk oxides were submitted to microbeam irradiation using protons, deuterons and helium-4 ions. First of all, the sputtering coefficients of transition metals have been measured and compared with calculated data issued from different theoretical models and the role of the main experimental parameters are discussed. Secondly, the general behaviour of various target materials under microbeam impact is described in terms of irradiation induced-effects.

引用

页码：571 / 575

页数：5

共 16 条

[1] NUCLEAR MICROPROBE LOCAL CHARACTERIZATION OF YBACUO SUPERCONDUCTORS [J].