STRESS-RELAXATION OF CONTINUOUS FILM AND NARROW LINE METALLIZATIONS OF ALUMINUM ON SILICON SUBSTRATES

被引：22

作者：

KORHONEN, MA

PASZKIET, CA

BLACK, RD

LI, CY

机构：

[1] Department of Materials Science and Engineering, Cornell University, Ithaca

来源：

SCRIPTA METALLURGICA ET MATERIALIA | 1990年 / 24卷 / 12期

基金：

美国国家科学基金会; 芬兰科学院;

关键词：

15;

D O I：

10.1016/0956-716X(90)90082-R

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：2297 / 2302

页数：6

共 15 条

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[5] X-RAY DETERMINATION OF THE RESIDUAL-STRESSES IN THIN ALUMINUM FILMS DEPOSITED ON SILICON SUBSTRATES [J].

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[6]

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[8] MECHANICAL-PROPERTIES OF THIN-FILMS [J].

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[9]

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[10]

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