CORRELATION BETWEEN ELECTRICAL-PROPERTIES AND AES CONCENTRATION-DEPTH PROFILES OF NICR THIN-FILMS

被引：23

作者：

HOFMANN, S

ZALAR, A

机构：

[1] HAX PLANCK INST MET FORSCH, INST WERKSTOFF WISSENSCH, D-7000 STUTTGART 1, GERMANY

[2] INST ELECTR & VACUUM TECHN, LJUBLJANA, YUGOSLAVIA

来源：

关键词：

D O I：

10.1016/0040-6090(76)90639-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：219 / 225

页数：7

共 23 条

[1] TEMPERATURE COEFFICIENTS OF RESISTANCE OF METALLIC FILMS IN THE TEMPERATURE RANGE 25-DEGREES-C TO 600-DEGREES-C
BELSER, RB
HICKLIN, WH
[J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (03) : 313 - 322
[2] AES STUDIES OF SURFACE COMPOSITION OF AG-CU ALLOYS
BRAUN, P
FARBER, W
[J]. SURFACE SCIENCE, 1975, 47 (01) : 57 - 63
[3] EFFECT OF COMPOSITION ON TEMPERATURE COEFFICIENT OF RESISTANCE OF NICR FILMS
CAMPBELL, DS
HENDRY, B
[J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1965, 16 (11): : 1719 - &
[4] Carter G., 1968, ION BOMBARDMENT SOLI
[5] CHEMICAL EFFECTS IN AUGER-ELECTRON SPECTROSCOPY
HAAS, TW
GRANT, JT
DOOLEY, GJ
[J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) : 1853 - &
[6] EVALUATION OF CONCENTRATION-DEPTH PROFILES BY SPUTTERING IN SIMS AND AES
HOFMANN, S
[J]. APPLIED PHYSICS, 1976, 9 (01): : 59 - 66
[7] HOFMANN S, 1974, Z METALLKD, V65, P778
[8] HOFMANN S, 1975, 3RD S GAS SURF INT M
[9] HOFMANN S, 1974, POWDER METALL INT, V6, P90
[10] HUIJER P, 1962, PHILIPS TECH RUNDSCH, V4, P126