LOCAL EQUILIBRIUM-MODEL OF MORPHOLOGICAL INSTABILITIES IN CHEMICAL VAPOR-DEPOSITION

被引：41

作者：

PALMER, BJ

GORDON, RG

机构：

[1] Harvard Univ, Cambridge, MA, USA, Harvard Univ, Cambridge, MA, USA

来源：

THIN SOLID FILMS | 1988年 / 158卷 / 02期

关键词：

D O I：

10.1016/0040-6090(88)90034-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：313 / 341

页数：29

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