AN INSITU STUDY ON ELECTROLESS-DEPOSITION PROCESS BY SCANNING TUNNELING MICROSCOPY

被引：20

作者：

HOMMA, T

YAMAZAKI, T

OSAKA, T

机构：

[1] Department of Applied Chemistry, Waseda University, Okubo, Shinjuku-ku

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1992年 / 139卷 / 03期

关键词：

D O I：

10.1149/1.2069293

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.

引用

页码：732 / 736

页数：5

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