SOLUBILITY AND DIFFUSIVITY OF ARGON IN VITREOUS SILICA

被引:27
作者
NAKAYAMA, GS
SHACKELFORD, JF
机构
[1] Division of Materials Science and Engineering, University of California, Davis
基金
美国国家科学基金会;
关键词
D O I
10.1016/0022-3093(90)90826-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Saturation of vitreous silica fibers by argon gas has provided solubility and diffusivity data in good agreement with previous experimental and modeling studies. Over the temperature range of 525-675-degrees-C, the solubility of argon in vitreous silica can be given by S = (2.09 x 10+21 atoms/(m3 atm)) exp((+ 31.5 kJ/g atom)/RT). These data indicate that the density of interstitial solubility sites accessible to argon atoms is 1.1 x 10(26) m-3, consistent with the log-normal model of interstitial site size distribution, a useful illustration of medium-range glass structure. Over the temperature range of 500-905-degrees-C, the diffusivity of argon in vitreous silica can be given by: D = (0.506 x 10(-8) m2/s) exp((- 113 kJ/g atom)/RT).
引用
收藏
页码:249 / 254
页数:6
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