NORMALIZED AND AVERAGE CURRENT DISTRIBUTIONS ON UNEVENLY SPACED PATTERNS

被引:30
作者
WEST, AC
MATLOSZ, M
LANDOLT, D
机构
[1] Laboratoire de metallumie chimique, Ecole Polytechnique Federate de Lausanne, Departement de matériaux MX-C Emblems
关键词
D O I
10.1149/1.2085666
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Spatial variations in electrochemical etch rate are predicted for an unevenly spaced pattern of lines. Two models, based on primary current distribution calculations, are presented. One model is used to estimate the normalized current distribution on an individual line of the pattern. The results indicate that the model, which accounts only for the placement of the nearest neighbor lines while ignoring the other geometric details, predicts well the primary current distribution. The other model, based on boundary integral equations, is used for an estimation of the distribution from line to line of the average current densities. The results, which agree with experiment, are insensitive to the details of the normalized current distributions that are assumed on the individual lines in the pattern.
引用
收藏
页码:728 / 735
页数:8
相关论文
共 16 条
[1]  
ABRAMOWITZ M, 1964, HDB MATH FUNCTIONS, P80
[2]  
Brebbia CA, 1981, BOUNDARY ELEMENT MET
[3]   APPLICATION OF CHEMICAL AND ELECTROCHEMICAL MICROMACHINING IN THE ELECTRONICS INDUSTRY [J].
DATTA, M ;
ROMANKIW, LT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (06) :C285-C292
[4]   CALCULATION OF CURRENT DISTRIBUTION AND ELECTRODE SHAPE CHANGE BY THE BOUNDARY ELEMENT METHOD [J].
DECONINCK, J ;
MAGGETTO, G ;
VEREECKEN, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (12) :2960-2965
[5]   THE INFLUENCE OF SMALL MACHINING ERRORS ON THE PRIMARY CURRENT DISTRIBUTION AT A RECESSED ELECTRODE [J].
DIEM, CB ;
NEWMAN, B ;
ORAZEM, ME .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (10) :2524-2530
[6]  
DINAN T, UNPUB
[7]   MASS-TRANSFER ANALYSIS OF ELECTRODEPOSITION THROUGH POLYMERIC MASKS [J].
HUME, EC ;
DEEN, WM ;
BROWN, RA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (06) :1251-1258
[8]   ETCHING - A TWO-DIMENSIONAL MATHEMATICAL APPROACH [J].
KUIKEN, HK .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 1984, 392 (1802) :199-225
[9]   ETCHING PROFILES AT RESIST EDGES .1. MATHEMATICAL-MODELS FOR DIFFUSION-CONTROLLED CASES [J].
KUIKEN, HK ;
KELLY, JJ ;
NOTTEN, PHL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (06) :1217-1226
[10]   SECONDARY CURRENT DISTRIBUTION IN A HULL CELL - BOUNDARY ELEMENT AND FINITE-ELEMENT SIMULATION AND EXPERIMENTAL-VERIFICATION [J].
MATLOSZ, M ;
CRETON, C ;
CLERC, C ;
LANDOLT, D .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (12) :3015-3021