ETCH RATE AND DETERIORATION OF MAGNESIUM ALUMINUM SPINEL IN HYDROGEN

被引:7
作者
GREEN, JM
机构
关键词
D O I
10.1149/1.2404095
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
In this paper the rate of material removal in hydrogen of stoichiometric spinel is presented as a function of crystallographic orientation, time, and temperature. For example, at 1000 degree C the rate is similar 1 A/min; at 1300 degree C, similar 100 A/min. However, it was found that sucha hydrogen ambient promotes crazing of the substrate surface, thus degrading its suitability for heteroepitaxy. This phenomenon was studied, and it is suggested that the cause is due to a preferential out-diffusion of magnesium from the surface, which induces a strain large enough to result in brittle fracture. It has been shown that the crazing is obviated by the use of helium as a carrier gas.
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页码:1765 / &
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共 19 条
[1]   CHEMICAL POLISHING OF MAGNESIUM ALUMINATE SPINEL IN PYROPHOSPHORIC ACID [J].
AESCHLIM.R ;
GASSMANN, F ;
WOODMAN, TP .
MATERIALS RESEARCH BULLETIN, 1970, 5 (03) :167-&
[2]  
BUCK TM, 1970, P S SILICON DEVICE P
[3]  
CULLEN CW, 1971, J CRYSTAL GROWTH, V9, P107
[4]   SINGLE-CRYSTAL FILMS OF SILICON ON INSULATORS [J].
FILBY, JD ;
NIELSEN, S .
BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (10) :1357-&
[5]  
GRAY DE, 1963, AM I PHYSICS HDB, P4
[6]   A STUDY OF GRINDING DAMAGE IN MAGNESIUM OXIDE SINGLE CRYSTALS [J].
KOEPKE, BG ;
STOKES, RJ .
JOURNAL OF MATERIALS SCIENCE, 1970, 5 (03) :240-&
[7]   REACTIONS BETWEEN REFRACTORY OXIDES AND GRAPHITE [J].
KOMAREK, KL ;
COUCOULAS, A ;
KLINGER, N .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (07) :783-791
[8]   DIFFUSION OF HYDROGEN IN NATURAL AND SYNTHETIC FUSED QUARTZ [J].
LEE, RW .
JOURNAL OF CHEMICAL PHYSICS, 1963, 38 (02) :448-&
[9]   SINGLE-CRYSTAL SILICON ON SAPPHIRE SUBSTRATE [J].
MANASEVIT, HM ;
SIMPSON, WI .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (04) :1349-&
[10]  
MAURITZ JEA, 1969, OCT EL SOC M DETR MI