IMPROVEMENT OF PLANAR GAAS DEVICES BY CONTROLLING PROPERTIES OF EPILAYER AND EPILAYER-SUBSTRATE INTERFACE

被引:1
作者
KAUFMANN, LMF [1 ]
HEIME, K [1 ]
机构
[1] TECH UNIV AACHEN,INST SEMICOND ELECTR,SONDERFORSCH BEREICH FESTKORPER ELECTR 56,D-5100 AACHEN,FED REP GER
关键词
D O I
10.7567/JJAPS.16S1.107
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:107 / 110
页数:4
相关论文
共 3 条
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Engemann J., 1975, Critical Reviews in Solid State Sciences, V5, P485, DOI 10.1080/10408437508243508
[2]   INFLUENCE OF HEAT-TREATMENT ON MORPHOLOGICAL AND ELECTRICAL-PROPERTIES OF GAAS EPILAYER-SUBSTRATE INTERFACE [J].
KAUFMANN, LMF ;
HEIME, K ;
BURCHARD, WG .
JOURNAL OF CRYSTAL GROWTH, 1976, 34 (02) :289-297
[3]  
NELSON H, 1974, J CRYSTAL GROWTH, V27, P49