PROPERTIES OF BERYLLIUM SURFACES AND FILMS

被引：22

作者：

ADAMS, RO

HURD, JT

机构：

[1] The Dow Chemical Company, Rocky Flats Division, Golden

来源：

JOURNAL OF THE LESS-COMMON METALS | 1969年 / 18卷 / 04期

关键词：

D O I：

10.1016/0022-5088(69)90009-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Surface chemistry and surface physics literature on bulk beryllium and beryllium films is reviewed and presented. It is found that surface chemistry studies to date have been confined to beryllium oxidation in various environments. Surface physics studies have included photoelectric yields, work function and sputtering yield measurements. © 1969.

引用

页码：399 / &

共 46 条

[1] ADAMS RA, TO BE PUBLISHED
[2] THE HIGH TEMPERATURE OXIDATION OF BERYLLIUM .4. IN WATER VAPOUR AND IN MOIST OXYGEN
AYLMORE, DW
GREGG, SJ
JEPSON, WB
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[3] AYLMORE DW, 1961, J NUCL MATER, V3, P169
[4] BLAKE R, 1965, AEDCONF196504016 US
[5] BLANCHARD R, 1961, AECTR6586 US AT EN C
[6] BRADSHAW W, 1961, LMSD895073 US AT EN
[7] BRADSHAW W, 1960, LMSD288232 US AT EN
[8] THE OXIDATION OF BERYLLIUM AT HIGH TEMPERATURES
CUBICCIOTTI, D
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1950, 72 (05) : 2084 - 2086
[9] CATASTROPHIC OXIDATION OF BERYLLIUM METAL
ERVIN, G
MACKAY, TL
[J]. JOURNAL OF NUCLEAR MATERIALS, 1964, 12 (01) : 30 - 39
[10] CATHODIC SPUTTERING FOR MICRO-DIFFUSION STUDIES
FISHER, TF
WEBER, CE
[J]. JOURNAL OF APPLIED PHYSICS, 1952, 23 (02) : 181 - 183

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