HOLLOW-CATHODE ETCHING AND DEPOSITION

被引：40

作者：

HORWITZ, CM ^{[1
]}

BORONKAY, S ^{[1
]}

GROSS, M ^{[1
]}

DAVIES, K ^{[1
]}

机构：

[1] SEMITEQ LABTAM PROPRIETARY LTD,BRAESIDE,VIC 3195,AUSTRALIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575265

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1837 / 1844

页数：8

共 42 条

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