THE ADSORPTION OF HALOGENS ON METAL FILMS .1. ADSOPRTION MEASUREMENTS AND SURFACE POTENTIALS FOR CHLORINE ON NICKEL

被引：21

作者：

ANDERSON, JR

机构：

来源：

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS | 1960年 / 16卷 / 3-4期

关键词：

D O I：

10.1016/0022-3697(60)90159-1

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

收藏

页码：291 / &

相关论文

共 20 条

[1] NEW DEVELOPMENTS IN THE PRODUCTION AND MEASUREMENT OF ULTRA HIGH VACUUM
ALPERT, D
[J]. JOURNAL OF APPLIED PHYSICS, 1953, 24 (07) : 860 - 876
[2] VACUUM VALVE FOR THE HANDLING OF VERY PURE GASES
ALPERT, D
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1951, 22 (07) : 536 - 537
[3] PRESSURE GAUGE FOR CORROSIVE GASES IN THE MICRON AND SUBMICRON REGION
ANDERSON, JR
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1958, 29 (12) : 1073 - 1078
[4] THERMAL REGENERATION IN THE NICKEL-OXYGEN SYSTEM
ANDERSON, JS
KLEMPERER, DF
[J]. NATURE, 1959, 184 (4690) : 899 - 899
[5] Catalytic activity, crystal structure and adsorptive properties of evaporated metal films
Beeck, O
Smith, AE
Wheeler, A
[J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1940, 177 (A968) : 0062 - 0090
[6] ALL-GLASS VALVES FOR USE IN OBTAINING ULTRA HIGH VACUA
DECKER, RW
[J]. JOURNAL OF APPLIED PHYSICS, 1954, 25 (11) : 1441 - 1442
[7] ELECTRICAL CONTACT FOR HIGH VACUUM SYSTEMS
GOMER, R
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1956, 27 (07) : 544 - 544
[8] JONES HA, 1927, GEN ELECTR REV, V30, P310
[9] KLEMPERER DF, 1958, PROC R SOC LON SER-A, V243, P375
[10] Chemical reactions at low pressures
Langmuir, I
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1915, 37 : 1139 - 1167