RF-SPUTTERED AMORPHOUS SI-CRYSTALLINE SI JUNCTIONS

被引：6

作者：

MEI, L

GREENE, JE

机构：

[1] UNIV ILLINOIS,DEPT MECH ENGN,URBANA,IL 61801

[2] UNIV ILLINOIS,DEPT MET,URBANA,IL

[3] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 01期

关键词：

D O I：

10.1116/1.1318549

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：145 / 148

页数：4

共 26 条

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[6] SWITCHING AND NEGATIVE RESISTANCE IN AMORPHOUS BORON LAYERS
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[9] MEASUREMENT OF HIGH-RESISTIVITY SEMICONDUCTORS USING VANDERPAUW METHOD
HEMENGER, PM
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (06) : 698 - 700
[10] Henisch H K, 1972, J NON-CRYST SOLIDS, V8-10, P415