PHASE FORMING PROCESSES IN TANTALUM FILMS THROUGH SPUTTERING

[1] GERSTENBERG D, 1962, P ELECTRON COMPONETS, P57

[2] MENZEL D, 1967, FUNDAMENTALS GAS SUR, P493

[3] IONIC CONDUCTIVITY DIELECTRIC CONSTANT AND OPTICAL PROPERTIES OF ANODIC OXIDE FILMS ON 2 TYPES OF SPUTTERED TANTALUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) : 1821 - &

[4] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J]. APPLIED PHYSICS LETTERS, 1965, 7 (03) : 51 - &

[5] THERMAL ACCOMMODATION COEFFICIENT OF HELIUM ON A BARE TUNGSTEN SURFACE [J]. JOURNAL OF CHEMICAL PHYSICS, 1955, 23 (05) : 861 - 866

[6] VRATNY F, 1968, ELECTROCHEM TECH, V5, P5

[7] VRATNY F, 1964, 11 NAT S AM VAC SOC

[1] GERSTENBERG D, 1962, P ELECTRON COMPONETS, P57

[2] MENZEL D, 1967, FUNDAMENTALS GAS SUR, P493

[3] IONIC CONDUCTIVITY DIELECTRIC CONSTANT AND OPTICAL PROPERTIES OF ANODIC OXIDE FILMS ON 2 TYPES OF SPUTTERED TANTALUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) : 1821 - &

[4] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E) [J]. APPLIED PHYSICS LETTERS, 1965, 7 (03) : 51 - &

[5] THERMAL ACCOMMODATION COEFFICIENT OF HELIUM ON A BARE TUNGSTEN SURFACE [J]. JOURNAL OF CHEMICAL PHYSICS, 1955, 23 (05) : 861 - 866

[6] VRATNY F, 1968, ELECTROCHEM TECH, V5, P5

[7] VRATNY F, 1964, 11 NAT S AM VAC SOC