ELECTRON HOLOGRAPHY APPROACHING ATOMIC RESOLUTION

被引：210

作者：

LICHTE, H

机构：

来源：

ULTRAMICROSCOPY | 1986年 / 20卷 / 03期

关键词：

D O I：

10.1016/0304-3991(86)90193-2

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

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页码：293 / 304

页数：12

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共 10 条

[1] ANALYSIS OF PHOTOGRAPHIC-EMULSIONS FOR ELECTRON-MICROSCOPY OF TWO-DIMENSIONAL CRYSTALLINE SPECIMENS
DOWNING, KH
GRANO, DA
[J]. ULTRAMICROSCOPY, 1982, 7 (04) : 381 - 403
[2] FRANKE FJ, 1985, OPTIK S, V1, P22
[3] FRIESER H, 1959, Z ANGEW PHYS, V11, P190
[4] A NEW MICROSCOPIC PRINCIPLE
GABOR, D
[J]. NATURE, 1948, 161 (4098) : 777 - 778
[5] HANSZEN KJ, 1982, ADV ELECTRON EL PHYS, V59, P1
[6] MOLLENSTEDT G, 1954, NATURWISS ENSCHAFTER, V42, P41
[7] SPHERICAL-ABERRATION CORRECTION OF AN ELECTRON LENS BY HOLOGRAPHY
TONOMURA, A
MATSUDA, T
ENDO, J
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (07) : 1373 - 1377
[8] HIGH-RESOLUTION ELECTRON HOLOGRAPHY WITH FIELD-EMISSION ELECTRON-MICROSCOPE
TONOMURA, A
MATSUDA, T
ENDO, J
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (01) : 9 - 14
[9] WAHL H, 1975, THESIS TUBINGEN
[10] LIMITATIONS OF FRINGE-PARAMETER ESTIMATION AT LOW LIGHT LEVELS
WALKUP, JF
GOODMAN, JW
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1973, 63 (04) : 399 - 407