STRUCTURE OF ION-PLATED AMORPHOUS HYDROGENATED CARBON-FILMS INVESTIGATED BY ELECTRON-ENERGY LOSS SPECTROSCOPY

被引：12

作者：

MUHLING, I

BEWILOGUA, K

BREUER, K

机构：

[1] Sektion Physik/Elektronische Bauelemente, Technische Universität, 9010 Karl-Marx-Stadt

来源：

THIN SOLID FILMS | 1990年 / 187卷 / 01期

关键词：

D O I：

10.1016/0040-6090(90)90110-Y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin ion-plated amorphous hydrogenated carbon films were investigated by electron energy loss spectroscopy. From an analysis of the dielectric function, information on the film structure could be obtained. The results will be compared with those of electron diffraction studies. Differences between insulating and conducting substrates could be verified in the film structure and are related to surface charging effects. From an analysis of the oscillator strength sum rule the content of C sp2 atoms was estimated. © 1990.

引用

页码：65 / 75

页数：11

共 31 条

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