FRACTALITY AND IMPEDANCE OF ELECTROCHEMICALLY GROWN SILVER DEPOSITS

被引：41

作者：

KAHANDA, GLMKS ^{[1
]}

TOMKIEWICZ, M ^{[1
]}

机构：

[1] CUNY GRAD SCH & UNIV CTR,NEW YORK,NY 10036

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1990年 / 137卷 / 11期

关键词：

D O I：

10.1149/1.2086233

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The frequency dispersions of the impedance of smooth and ramified silver deposits, in their oxidized and unoxidized states, were measured. We sought to correlate the constant phase angle exponent with the surface fractal dimension of the deposits, and compare the results with present theories. A monotonic relationship between the two parameters was found. The results agree with theoretical predictions that the functional relationship is insensitive to the dielectric properties of the interface. © 1990, The Electrochemical Society, Inc. All rights reserved.

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页码：3423 / 3429

页数：7

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