INFLUENCE OF TARGET-SUBSTRATE DISTANCE AND OXYGEN-PRESSURE ON MORPHOLOGY, ORIENTATION AND HOMOGENEITY OF LASER-DEPOSITED YBA2CU3O7 FILMS ON MGO (100)

被引：7

作者：

GOERKE, F ^{[1
]}

THORNS, A ^{[1
]}

机构：

[1] UNIV HAMBURG,ZENTRUM MIKROSTRUKT FORSCH,D-20355 HAMBURG,GERMANY

来源：

PHYSICA C | 1995年 / 251卷 / 3-4期

关键词：

D O I：

10.1016/0921-4534(95)00333-9

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A pulsed KrF excimer laser is used to deposit YBa2Cu3O7 films on MgO (100). We report on the influence of target-substrate distance, oxygen pressure and substrate temperature in the range of 30 to 100 mm, 0.03 to 0.4 mbar and 732 to 800 degrees C, respectively. The film quality is characterized by electrical properties, homogeneity, orientation and morphology. At the pressure of 0.4 mbar we obtain optimum electrical and morphological properties for a target-substrate distance of about 46 mm. The homogeneity can be improved by increasing the target-substrate distance. In order to maintain smooth surfaces, it is necessary to decrease the oxygen pressure. A sensitive influence of the oxygen pressure on the orientation is observed, when the pressure is reduced below 0.1 mbar, i.e. a smaller offer of oxidized elements seems to favor a-axis orientation. Optimum deposition parameters for the target-substrate distance of 100 mm are found to be the oxygen pressure of 0.07 mbar and the substrate temperature of 765 degrees C.

引用

页码：247 / 254

页数：8

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