X-RAY PHOTOELECTRON SPECTROSCOPIC STUDIES WITH A BIAS-POTENTIAL METHOD FOR STUDYING SILANE ALUMINUM INTERFACES

被引：17

作者：

LEUNG, YL ^{[1
]}

YANG, YP ^{[1
]}

WONG, PC ^{[1
]}

MITCHELL, KAR ^{[1
]}

FOSTER, T ^{[1
]}

机构：

[1] DEF RES ESTAB PACIFIC,CHEM GRP,VICTORIA V0S 1B0,BC,CANADA

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 1993年 / 12卷 / 11期

关键词：

D O I：

10.1007/BF00277993

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：844 / 846

页数：3

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