AVALANCHE MULTIPLICATION FACTORS IN GE AND SI ABRUPT JUNCTIONS

被引:12
作者
SPIRITO, P [1 ]
机构
[1] UNIV NAPLES,INST ELECT ENGN,NAPLES,ITALY
关键词
D O I
10.1109/T-ED.1974.17900
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:226 / 231
页数:6
相关论文
共 6 条
[1]   IONIZATION RATES OF HOLES + ELECTRONS IN SILICON [J].
LEE, CA ;
KLEIMACK, JJ ;
BATDORF, RL ;
WIEGMANN, W ;
LOGAN, RA .
PHYSICAL REVIEW, 1964, 134 (3A) :A761-+
[2]   AVALANCHE BREAKDOWN IN GERMANIUM [J].
MILLER, SL .
PHYSICAL REVIEW, 1955, 99 (04) :1234-1241
[3]  
MOLL JL, 1970, IEEE T ELECTRON DEVI, VED17, P420
[4]  
SPIRITO P, 1972, IEEE T ELECTRON DEV, VED19, P951
[5]   AVALANCHE BREAKDOWN VOLTAGES OF ABRUPT AND LINEARLY GRADED P-N JUNCTIONS IN GE SI GAAS AND GAP - (DOPANT EFFECTS IMPURITY EFFECTS T) [J].
SZE, SM ;
GIBBONS, G .
APPLIED PHYSICS LETTERS, 1966, 8 (05) :111-&
[6]   MEASUREMENT OF IONIZATION RATES IN DIFFUSED SILICON P-N JUNCTIONS [J].
VANOVERSTRAETEN, R ;
DEMAN, H .
SOLID-STATE ELECTRONICS, 1970, 13 (05) :583-+