OXYGEN-DIFFUSION-SIZE EFFECT IN ELECTROLESS METAL-DEPOSITION

被引：32

作者：

JACOBS, JWM

RIKKEN, JMG

机构：

[1] Philips Research Lab, Netherlands

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 11期

关键词：

D O I：

10.1149/1.2095440

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2822 / 2827

页数：6

共 26 条

[1]

BRANITSKY GA, 1982, 1982 INT C PHOT SCI, P235

[2]

DEMINJER CH, 1973, J ELECTROCHEM SOC, V120, P1644

[3] THE APPLICATION OF MICROELECTRODES TO THE STUDY OF HOMOGENEOUS PROCESSES COUPLED TO ELECTRODE-REACTIONS .1. EC' AND CE REACTIONS [J].

FLEISCHMANN, M ;

LASSERRE, F ;

ROBINSON, J ;

SWAN, D .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1984, 177 (1-2) :97-114

[4] NUCLEATION AND GROWTH OF ELECTROLESS NICKEL DEPOSITS ON MOLYBDENUM ACTIVATED WITH PALLADIUM [J].

FLIS, J ;

DUQUETTE, DJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (01) :51-57

[5] INITIATION OF ELECTROLESS NICKEL PLATING ON COPPER, PALLADIUM-ACTIVATED COPPER, GOLD, AND PLATINUM [J].

FLIS, J ;

DUQUETTE, DJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) :254-260

[6] CATALYTIC ACTIVITY OF IRON, NICKEL, AND NICKEL-PHOSPHORUS IN ELECTROLESS NICKEL PLATING [J].

FLIS, J ;

DUQUETTE, DJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (01) :34-39

[7]

GEMMLER A, 1984, METALOBERFLACHE, V38, P388

[8]

GEMMLER A, 1984, METALLOBERFLACHE, V38, P343

[9] THE CHARACTERIZATION OF VIA-FILLING TECHNOLOGY WITH ELECTROLESS PLATING METHOD [J].

HARADA, Y ;

FUSHIMI, K ;

MADOKORO, S ;

SAWAI, H ;

USHIO, S .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (11) :2428-2430

[10] PHOTOCHEMICAL NUCLEATION AND GROWTH OF PD ON TIO2 FILMS STUDIED WITH ELECTRON-MICROSCOPY AND QUANTITATIVE ANALYTICAL TECHNIQUES [J].

JACOBS, JWM .

JOURNAL OF PHYSICAL CHEMISTRY, 1986, 90 (24) :6507-6517

← 1 2 3 →