POSITRON BEAM DEFECT PROFILING OF SILICON EPITAXIAL LAYERS

被引:32
作者
SCHUT, H [1 ]
VANVEEN, A [1 ]
VANDEWALLE, GFA [1 ]
VANGORKUM, AA [1 ]
机构
[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS
关键词
D O I
10.1063/1.349329
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial layers of silicon grown on a Si(100) substrate by molecular-beam epitaxy (MBE) and solid-phase epitaxy (SPE) have been investigated by slow positron beam analysis methods. Results of Doppler broadening measurements revealed that the S parameter of the SPE material is considerably higher than the value measured for the MBE layer, indicative of a higher concentration of open-volume defects in the former material. This was confirmed by measurements of the positronium fraction at elevated temperatures.
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页码:3003 / 3006
页数:4
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