EFFECT OF SUBSTRATE TEMPERATURE ON OPTICAL-PROPERTIES OF REACTIVELY EVAPORATED SILICON-OXIDE FILMS

被引：9

作者：

BRADFORD, AP

HASS, G

MCFARLAND, M

RITTER, E

机构：

[1] USA,ELECTR COMMAND,NIGHT VIS LAB,FT BELVOIR,VA 22060

[2] BALZERS AKTIENGESELLSHAFT,FURSTENTUM,LIECHTENSTEIN

来源：

THIN SOLID FILMS | 1977年 / 42卷 / 03期

关键词：

D O I：

10.1016/0040-6090(77)90371-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：361 / 367

页数：7

共 15 条

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[3] INCREASING FAR-ULTRAVIOLET REFLECTANCE OF SILICON-OXIDE-PROTECTED ALUMINUM MIRRORS BY ULTRAVIOLET IRRADIATION [J].

BRADFORD, AP ;

HASS, C .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1963, 53 (09) :1096-+

[4] SOLAR ABSORPTIVITY AND THERMAL EMISSIVITY OF ALUMINUM COATED WITH SILICON OXIDE FILMS PREPARED BY EVAPORATION OF SILICON MONOXIDE [J].

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HASS, G ;

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APPLIED OPTICS, 1970, 9 (02) :339-&

[5] OPTICAL PROPERTIES OF EVAPORATED MAGNESIUM-OXIDE FILMS IN O.22-8-MU WAVELENGTH REGION [J].

BRADFORD, AP ;

MCFARLAN.M ;

HASS, G .

APPLIED OPTICS, 1972, 11 (10) :2242-+

[6] HERSTELLUNG UND ANALYSE VON SIO-AUFDAMPFSCHICHTEN VERSCHIEDENER OPTISCHER EIGENSCHAFTEN [J].

CREMER, E ;

PULKER, H .

MONATSHEFTE FUR CHEMIE, 1962, 93 (02) :491-&

[7]

GARSKI H, 1964, Z NATURFORSCH, V19, P1221

[8]

GUENTHER KG, 1957, Z PHYS, V149, P538

[9] OPTICAL PROPERTIES OF SILICON MONOXIDE IN THE WAVELENGTH REGION FROM 0.24 TO 14.0 MICRONS [J].

HASS, G ;

SALZBERG, CD .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1954, 44 (03) :181-187

[10] CHARGE STORAGE IN EVAPORATED SILICON OXIDE FILMS [J].

HOWSON, RP ;

TAYLOR, A .

THIN SOLID FILMS, 1970, 6 (01) :31-&

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