EVALUATION OF ONIUM SALT CATIONIC PHOTOINITIATORS AS NOVEL DISSOLUTION INHIBITOR FOR NOVOLAC RESIN

被引:32
作者
ITO, H
FLORES, E
机构
关键词
D O I
10.1149/1.2096263
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2322 / 2327
页数:6
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共 19 条
[1]   PHOTOINITIATED CATIONIC POLYMERIZATION BY DIALKYLPHENACYLSULFONIUM SALTS [J].
CRIVELLO, JV ;
LAM, JHW .
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1979, 17 (09) :2877-2892
[2]   DIARYLIODONIUM SALTS - NEW CLASS OF PHOTO-INITIATORS FOR CATIONIC POLYMERIZATION [J].
CRIVELLO, JV ;
LAM, JHW .
MACROMOLECULES, 1977, 10 (06) :1307-1315
[3]   NEW PREPARATION OF TRIARYLSULFONIUM AND TRIARYLSELENONIUM SALTS VIA COPPER(II)-CATALYZED ARYLATION OF SULFIDES AND SELENIDES WITH DIARYLIODONIUM SALTS [J].
CRIVELLO, JV ;
LAM, JHW .
JOURNAL OF ORGANIC CHEMISTRY, 1978, 43 (15) :3055-3058
[4]  
CRIVELLO JV, 1978, UV CURING SCI TECHNO
[5]  
FRECHET JMJ, 1986, J IMAGING SCI, V30, P59
[6]   DEEP UV PHOTORESISTS .1. MELDRUMS DIAZO SENSITIZER [J].
GRANT, BD ;
CLECAK, NJ ;
TWIEG, RJ ;
WILLSON, CG .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) :1300-1305
[7]  
HINSBERG WD, 1985, P SOC PHOTO-OPT INST, V539, P6, DOI 10.1117/12.947808
[8]  
HOFER DC, 1982, P SOC PHOTO-OPT INST, V334, P196, DOI 10.1117/12.933577
[9]   NOVEL POLYMERIC DISSOLUTION INHIBITOR FOR THE DESIGN OF SENSITIVE, DRY ETCH RESISTANT, BASE-DEVELOPABLE RESIST [J].
ITO, H ;
FLORES, E ;
RENALDO, AF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (09) :2328-2333
[10]  
ITO H, 1984, ACS SYM SER, V242, P11