WIDE-BANDGAP EPITAXIAL HETEROJUNCTION WINDOWS FOR SILICON SOLAR-CELLS

被引:23
作者
LANDIS, GA
LOFERSKI, JJ
BEAULIEU, R
SEKULAMOISE, PA
VERNON, SM
SPITZER, MB
KEAVNEY, CJ
机构
[1] SPIRE CORP,DIV ELECTR MAT,BEDFORD,MA 01730
[2] BROWN UNIV,PROVIDENCE,RI 02912
关键词
D O I
10.1109/16.46369
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The efficiency of a solar cell can be improved if minority carriers are confined by use of a wide-bandgap heterojunction “window.” For silicon (lattice constant a = 5.43 Å), nearly lattice-matched wide-bandgap materials are ZnS (a = 5.41 Å) and GaP (a = 5.45 Å). Isotype n-n heterojunctions of both ZnS/Si and GaP/Si were grown on silicon n-p homojunction solar cells. Successful deposition processes used were metalorganic chemical-vapor deposition (MO-CVD) for GaP and ZnS, and vacuum evaporation of ZnS. Planar (100) and (111) and texture-etched (111) faceted) surfaces were used. A decrease in minority-carrier surface recombination compared to a bare surface was seen from increased short-wavelength spectral response, increased open-circuit voltage, and reduced dark saturation current, with no degradation of the minority carrier diffusion length. © 1990 IEEE
引用
收藏
页码:372 / 381
页数:10
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